Invention Grant
- Patent Title: Polishing pad with alignment feature
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Application No.: US14610991Application Date: 2015-01-30
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Publication No.: US09249273B2Publication Date: 2016-02-02
- Inventor: Robert Kerprich , William C. Allison , Diane Scott
- Applicant: Robert Kerprich , William C. Allison , Diane Scott
- Applicant Address: US OR Hillsboro
- Assignee: NexPlanar Corporation
- Current Assignee: NexPlanar Corporation
- Current Assignee Address: US OR Hillsboro
- Agency: Blakely Sokoloff Taylor Zafman LLP
- Main IPC: B24B37/26
- IPC: B24B37/26 ; C08J9/228 ; B24B37/005 ; B24B37/20 ; B24D18/00
Abstract:
Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.
Public/Granted literature
- US20150152236A1 POLISHING PAD WITH ALIGNMENT FEATURE Public/Granted day:2015-06-04
Information query
