Invention Grant
US09249319B2 Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes
有权
用于蚀刻氮化硅和氧化硅层的液体添加剂,含有它们的金属油墨以及硅太阳能电池电极的制造方法
- Patent Title: Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes
- Patent Title (中): 用于蚀刻氮化硅和氧化硅层的液体添加剂,含有它们的金属油墨以及硅太阳能电池电极的制造方法
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Application No.: US13169515Application Date: 2011-06-27
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Publication No.: US09249319B2Publication Date: 2016-02-02
- Inventor: Joo-Youl Huh , Hyun-Gang Kim , Bo-Mook Chung , Sung-Bin Cho
- Applicant: Joo-Youl Huh , Hyun-Gang Kim , Bo-Mook Chung , Sung-Bin Cho
- Applicant Address: KR Seoul
- Assignee: Korea University Research and Business Foundation
- Current Assignee: Korea University Research and Business Foundation
- Current Assignee Address: KR Seoul
- Agency: Locke Lord LLP
- Agent Howard M. Gitten
- Priority: KR10-2010-0062329 20100629; KR10-2011-0016196 20110223
- Main IPC: C09K13/00
- IPC: C09K13/00 ; C09D11/03 ; H01L31/0224

Abstract:
The present invention relates to a liquid additive for etching silicon nitride and silicon oxide layers, a metal ink including the same for forming silicon solar cell electrodes and a method for manufacturing silicon solar cell electrodes. More particularly, it relates to a liquid additive including metal nitrate, metal acetate, or hydrates thereof and a metal ink for forming silicon solar cell electrodes, mixed with the liquid additive and a metal. Further, it relates to a method for manufacturing silicon solar cell electrodes comprising a one-step non-contact printing for etching of a silicon nitride layer or silicon oxide layer and forming electrodes.
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