Invention Grant
US09249319B2 Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes 有权
用于蚀刻氮化硅和氧化硅层的液体添加剂,含有它们的金属油墨以及硅太阳能电池电极的制造方法

Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes
Abstract:
The present invention relates to a liquid additive for etching silicon nitride and silicon oxide layers, a metal ink including the same for forming silicon solar cell electrodes and a method for manufacturing silicon solar cell electrodes. More particularly, it relates to a liquid additive including metal nitrate, metal acetate, or hydrates thereof and a metal ink for forming silicon solar cell electrodes, mixed with the liquid additive and a metal. Further, it relates to a method for manufacturing silicon solar cell electrodes comprising a one-step non-contact printing for etching of a silicon nitride layer or silicon oxide layer and forming electrodes.
Information query
Patent Agency Ranking
0/0