Invention Grant
- Patent Title: Method for high volume manufacture of electrochemical cells using physical vapor deposition
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Application No.: US12484966Application Date: 2009-06-15
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Publication No.: US09249502B2Publication Date: 2016-02-02
- Inventor: Fabio Albano , Chia-Wei Wang , Ann Marie Sastry
- Applicant: Fabio Albano , Chia-Wei Wang , Ann Marie Sastry
- Applicant Address: US MI Ann Arbor
- Assignee: SAKTI3, INC.
- Current Assignee: SAKTI3, INC.
- Current Assignee Address: US MI Ann Arbor
- Agency: Ogawa P.C.
- Agent Richard T. Ogawa
- Main IPC: H01M10/02
- IPC: H01M10/02 ; C23C14/34 ; C23C14/56 ; C23C16/54 ; H01M4/04 ; H01M4/139 ; H01M10/052 ; H01M10/0587 ; H01M10/0562 ; H01M10/0565

Abstract:
Embodiments of the present invention relate to apparatuses and methods for fabricating electrochemical cells. One embodiment of the present invention comprises a single chamber configurable to deposit different materials on a substrate spooled between two reels. In one embodiment, the substrate is moved in the same direction around the reels, with conditions within the chamber periodically changed to result in the continuous build-up of deposited material over time. Another embodiment employs alternating a direction of movement of the substrate around the reels, with conditions in the chamber differing with each change in direction to result in the sequential build-up of deposited material over time. The chamber is equipped with different sources of energy and materials to allow the deposition of the different layers of the electrochemical cell.
Public/Granted literature
- US20090325063A1 METHOD FOR HIGH VOLUME MANUFACTURE OF ELECTROCHEMICAL CELLS USING PHYSICAL VAPOR DEPOSITION Public/Granted day:2009-12-31
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