Invention Grant
- Patent Title: Vacuum storage method and device for crystalline material
- Patent Title (中): 结晶材料的真空储存方法和装置
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Application No.: US14240844Application Date: 2011-08-25
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Publication No.: US09250014B2Publication Date: 2016-02-02
- Inventor: Yukichi Horioka , Jiro Kajiwara , Hirotsugu Sanada
- Applicant: Yukichi Horioka , Jiro Kajiwara , Hirotsugu Sanada
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS TECHNO CORPORATION
- Current Assignee: MITSUBISHI MATERIALS TECHNO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- International Application: PCT/JP2011/069233 WO 20110825
- International Announcement: WO2013/027299 WO 20130228
- Main IPC: F26B13/10
- IPC: F26B13/10 ; F26B3/18 ; C30B11/00 ; C30B15/00 ; C30B15/10 ; C30B29/06 ; C30B29/42 ; B22F3/00

Abstract:
The present invention provides a method for storing a raw material inside a mold or a crucible, comprising the steps of: closing an opening of the mold filled with the raw material of a sintered metal or an opening of the crucible filled with the raw material for encouraging growth of a crystal for a semiconductor of a gallium arsenide crystal and a silicon single crystal or a polycrystalline silicon by a cap provided with a supply pipe and a vacuum evacuation pipe; vacuuming the inside the mold or crucible to a high vacuum state of 10−4 torr or less via the vacuum evacuation pipe; drying by heating the raw material in the mold or crucible filled with a heated inert gas in the range of 50 C. to 200 C. via the supply pipe; and storing the raw material in the mold or the crucible covered with the cap.
Public/Granted literature
- US09212850B2 Vacuum storage method and device for crystalline material Public/Granted day:2015-12-15
Information query
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