Invention Grant
- Patent Title: Immersion exposure apparatus and method with detection of liquid on members of the apparatus
- Patent Title (中): 浸渍曝光装置和方法，其检测装置的构件上的液体
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Application No.: US13742743Application Date: 2013-01-16
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Publication No.: US09250537B2Publication Date: 2016-02-02
- Inventor: Makoto Shibuta
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JPP2004-205009 20040712
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).
Public/Granted literature
- US20130128245A1 Exposure Apparatus and Device Manufacturing Method Public/Granted day:2013-05-23
Information query
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