Invention Grant
- Patent Title: Varnish containing good solvent and poor solvent
- Patent Title (中): 清漆含有良好的溶剂和不良溶剂
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Application No.: US11579066Application Date: 2005-04-28
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Publication No.: US09251923B2Publication Date: 2016-02-02
- Inventor: Taku Kato , Takuji Yoshimoto , Go Ono
- Applicant: Taku Kato , Takuji Yoshimoto , Go Ono
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2004-135572 20040430
- International Application: PCT/JP2005/008118 WO 20050428
- International Announcement: WO2005/107335 WO 20051110
- Main IPC: C08G73/00
- IPC: C08G73/00 ; H01B1/12 ; C08G73/02 ; C08G73/08 ; C08G73/18 ; C08G73/22 ; C09D165/00 ; C09D179/02 ; C09D179/04 ; C09D179/06 ; H01L51/00 ; H01L51/50

Abstract:
A varnish comprising a ground substance consisting of a polymer or oligomer of 200 to 50′104 molecular weight or organic compound of 200 to 1000 molecular weight and a solvent containing a good solvent and a poor solvent whose boiling point (under 760 mmHg) is at least 20° C. lower than that of the good solvent, wherein the ground substance is dissolved in the solvent. Any thin film prepared from this varnish is substantially from generation of foreign matter, so that it can appropriately be used as thin films for electronic devices and those for use in other technical fields.
Public/Granted literature
- US20070205400A1 Varnish Containing Good Solvent And Poor Solvent Public/Granted day:2007-09-06
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