Invention Grant
- Patent Title: Liquid processing apparatus
- Patent Title (中): 液体处理设备
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Application No.: US13846981Application Date: 2013-03-19
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Publication No.: US09252009B2Publication Date: 2016-02-02
- Inventor: Tsuyoshi Mizuno
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2012-090620 20120411; JP2013-030214 20130219
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/687 ; H01L21/02

Abstract:
A liquid processing apparatus according to the present disclosure includes: a substrate holding unit configured to horizontally hold a substrate; a rotation driving unit configured to rotate the substrate holding unit about a vertical axis; a processing liquid supply unit configured to supply a processing liquid to the substrate while the substrate is being rotated; an upper guide ring and a lower guide ring which are configured to be rotated together with the substrate holding unit, to surround the substrate, to be arranged vertically to overlap each other with a gap therebetween, and to guide the processing liquid scattered from the substrate; and a rotating cup configured to be rotated together with the substrate holding unit, and to receive and downwardly guide the guided processing liquid.
Public/Granted literature
- US20130269737A1 LIQUID PROCESSING APPARATUS Public/Granted day:2013-10-17
Information query
IPC分类: