Invention Grant
- Patent Title: Three-dimensional mounting semiconductor device and method of manufacturing three-dimensional mounting semiconductor device
- Patent Title (中): 三维安装半导体器件及其制造方法三维安装半导体器件
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Application No.: US14041073Application Date: 2013-09-30
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Publication No.: US09252070B2Publication Date: 2016-02-02
- Inventor: Yoshihiro Mizuno , Norinao Kouma , Osamu Tsuboi
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Staas & Halsey LLP
- Main IPC: H01L23/46
- IPC: H01L23/46 ; H01L23/473 ; H01L25/065 ; H01L25/00

Abstract:
A three-dimensional mounting semiconductor device includes a layer structure including a plurality of first substrates with a trench-shaped concavity formed in and a plurality of second substrates with semiconductor elements formed in, which are alternately stacked, wherein an unevenness defined by a size difference between the first substrate and the second substrate is formed on a side surface, and a first through-hole are defined by an inside surface of the trench-shaped concavity and a surface of the second substrate, and a third substrate jointed to the side surface of the layer structure and having an unevenness formed on a surface jointed to the layer structure which are engaged with the unevenness formed on the side surface of the layer structure.
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Information query
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