Invention Grant
- Patent Title: Transistor and method of fabricating the same
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Application No.: US14800251Application Date: 2015-07-15
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Publication No.: US09252222B2Publication Date: 2016-02-02
- Inventor: Sung Haeng Cho , Sang-Hee Park , Chi-Sun Hwang
- Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2013-0068263 20130614
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/66 ; H01L29/08 ; H01L29/786

Abstract:
Provided is a transistor. The transistor includes: a substrate; a semiconductor layer provided on the substrate and having one side vertical to the substrate and the other side facing the one side; a first electrode extending along the substrate and contacting the one side of the semiconductor layer; a second electrode extending along the substrate and contacting the other side of the semiconductor layer; a conductive wire disposed on the first electrode and spaced from the second electrode; a gate electrode provided on the semiconductor layer; and a gate insulating layer disposed between the semiconductor layer and the gate electrode, wherein the semiconductor layer, the first electrode, and the second electrode have a coplanar.
Public/Granted literature
- US20150318363A1 TRANSISTOR AND METHOD OF FABRICATING THE SAME Public/Granted day:2015-11-05
Information query
IPC分类: