Invention Grant
US09252293B2 Trench field effect diodes and methods of manufacturing those diodes 有权
沟槽场效应二极管和制造这些二极管的方法

Trench field effect diodes and methods of manufacturing those diodes
Abstract:
Diodes and methods of manufacturing diodes are disclosed. The diodes may include a cathode assembly and an anode assembly having an anode electrode, a gate electrode layer under the anode electrode, a gate oxide layer under the gate electrode layer, at least one P− body region under the gate oxide layer, and at least one trench that extends through the gate electrode layer, the gate oxide layer, and the at least one P− body region to the cathode assembly. The at least one trench may include a lower portion having (1) a bottom and a plurality of sidewalls defining a bottom volume and having an insulating layer and (2) a conductive material that is disposed within the bottom volume and that is in electrical communication with the anode electrode. The anode electrode may contact extend through the at least one trench to the conductive material.
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