Invention Grant
- Patent Title: Photovoltaic device, manufacturing method thereof, and photovoltaic module
- Patent Title (中): 光伏器件及其制造方法以及光伏模块
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Application No.: US13979272Application Date: 2012-03-02
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Publication No.: US09252305B2Publication Date: 2016-02-02
- Inventor: Satoshi Hamamoto
- Applicant: Satoshi Hamamoto
- Applicant Address: JP Chiyoda-Ku, Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Chiyoda-Ku, Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: WOPCT/JP2011/054959 20110303
- International Application: PCT/JP2012/055450 WO 20120302
- International Announcement: WO2012/118201 WO 20120907
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L31/0352 ; H01L31/0236 ; H01L31/068 ; H01L31/18

Abstract:
A photovoltaic device includes a silicon substrate of a first conduction type that includes an impurity diffusion layer on one surface side; a light-receiving-surface side electrode that includes a plurality of grid electrodes electrically connected to the impurity diffusion layer; and a back-surface side electrode formed on the other surface side of the silicon substrate wherein the impurity diffusion layer includes a first impurity diffusion layer and a second impurity diffusion layer, and wherein the first impurity diffusion layer is formed so that a direction perpendicular to a longitudinal direction of the grid electrodes is a longitudinal direction thereof, and so that an area ratio of the first impurity diffusion layer to a band region is equal to or lower than 50%.
Public/Granted literature
- US20130291924A1 PHOTOVOLTAIC DEVICE, MANUFACTURING METHOD THEREOF, AND PHOTOVOLTAIC MODULE Public/Granted day:2013-11-07
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