Invention Grant
US09252354B2 Vertical hall device with highly conductive opposite face node for electrically connecting first and second hall effect regions
有权
具有高导电性相对面节点的垂直霍尔装置,用于电连接第一和第二霍尔效应区域
- Patent Title: Vertical hall device with highly conductive opposite face node for electrically connecting first and second hall effect regions
- Patent Title (中): 具有高导电性相对面节点的垂直霍尔装置,用于电连接第一和第二霍尔效应区域
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Application No.: US13753195Application Date: 2013-01-29
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Publication No.: US09252354B2Publication Date: 2016-02-02
- Inventor: Udo Ausserlechner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Schiff Hardin LLP
- Main IPC: G01R33/07
- IPC: G01R33/07 ; H01L33/00 ; H01L43/04 ; H01L43/06

Abstract:
Vertical Hall device with highly conductive node for electrically connecting first and second Hall effect regions. A vertical Hall device comprises a first Hall effect region and a different second Hall effect region, both in a common semiconductor body. The first and second Hall effect regions have a main face and an opposite face, respectively. A highly conductive opposite face node is in ohmic contact to the opposite face of the first Hall effect region and the opposite face of the second Hall effect region in the semiconductor body. The vertical Hall device also comprises a first pair of contacts in or at the main face of the first Hall effect region and a second pair of contacts in or at the main face of the second Hall effect region. A convex circumscribing contour of the second pair of contacts is disjoint from a convex circumscribing contour of the first pair of contacts. Alternative embodiments comprise a pair of contacts and an opposite face node contact.
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