Invention Grant
- Patent Title: Method of calibrating a DPP-generated EUV light source
- Patent Title (中): 校准DPP生成的EUV光源的方法
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Application No.: US14108727Application Date: 2013-12-17
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Publication No.: US09253865B2Publication Date: 2016-02-02
- Inventor: Sven Walter Probst , Mohamad Hussein El-Husseini , Takahiro Hiraoka
- Applicant: USHIO Denki Kabushiki Kaisha
- Applicant Address: JP Tokyo-to
- Assignee: USHIO Denki Kabushiki Kaisha
- Current Assignee: USHIO Denki Kabushiki Kaisha
- Current Assignee Address: JP Tokyo-to
- Agency: Patentbar International, P.C.
- Priority: DE102012113007 20121221
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A method for controlling a discharge plasma-based radiation source for stabilizing a radiation dose emitted in a pulsed manner is disclosed. A calibration function is determined from a relationship between values of an input quantity and values of an operating parameter of the source by applying different values of the input quantity to the source. Reference value selected from the values of the operating parameter is brought about during a pulse of the source. The value of a test quantity is acquired at each pulse. Any quantity influencing the emitted radiation dose can be selected as test quantity. A statistical value is formed from a defined quantity of values of the test quantity. A deviation between the statistical value and the reference value is determined. A result of a comparison of the deviation with a predefined tolerance range determines whether the method is repeated.
Public/Granted literature
- US20140176005A1 Method of Calibrating a DPP-Generated EUV Light Source Public/Granted day:2014-06-26
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