Invention Grant
- Patent Title: Polishing apparatus, polishing pad, and polishing information management system
- Patent Title (中): 抛光装置,抛光垫和抛光信息管理系统
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Application No.: US13634705Application Date: 2011-03-09
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Publication No.: US09254545B2Publication Date: 2016-02-09
- Inventor: Jaehong Park
- Applicant: Jaehong Park
- Applicant Address: JP Osaka
- Assignee: Nitta Haas Incorporated
- Current Assignee: Nitta Haas Incorporated
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-063699 20100319
- International Application: PCT/JP2011/001379 WO 20110309
- International Announcement: WO2011/114658 WO 20110922
- Main IPC: B24B37/20
- IPC: B24B37/20 ; B24B49/10 ; B24B37/005 ; B24B37/015

Abstract:
A polishing pad has structural parts embedded therein; sensors, a memory for storing detected information obtained by the sensors, and a communication unit driven by a power supply unit to communicate with outside in a non-contact manner. The polishing pad and a communication unit configured to communicate with the communication unit of the polishing pad in a non-contact manner constitute a polishing information management system. The polishing pad and a communication unit configured to transmit and receive the information to and from the communication unit of the polishing pad in a non-contact manner constitute a polishing apparatus.
Public/Granted literature
- US20130052917A1 POLISHING APPARATUS, POLISHING PAD, AND POLISHING INFORMATION MANAGEMENT SYSTEM Public/Granted day:2013-02-28
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