Invention Grant
- Patent Title: Top gate mold with particle trap
- Patent Title (中): 顶门模具带有颗粒捕集器
-
Application No.: US13340319Application Date: 2011-12-29
-
Publication No.: US09254596B2Publication Date: 2016-02-09
- Inventor: Jerome Teysseyre , Glenn de los Reyes
- Applicant: Jerome Teysseyre , Glenn de los Reyes
- Applicant Address: SG Singapore
- Assignee: STMICROELECTRONICS PTE LTD.
- Current Assignee: STMICROELECTRONICS PTE LTD.
- Current Assignee Address: SG Singapore
- Agency: Seed IP Law Group PLLC
- Main IPC: B29C45/24
- IPC: B29C45/24 ; B29C45/17 ; B29C45/27

Abstract:
A top-gate molding system for encapsulating semiconductor devices includes a plurality of mold cavities formed between a middle plate and a bottom plate, and a runner system formed between an upper plate and the middle plate. The runner system includes a runner with a plurality of reservoirs along its length, with a gate extending from each of the reservoirs to one of the cavities. A particle trap is positioned on the bottom of the runner between a sprue and a first one of the reservoirs, to capture contaminating particles in a flow of molding compound before the particles enter any of the reservoirs. The particle trap can be, for example, a notch or a channel extending transversely across the bottom of the runner, or a dummy reservoir upstream of the first of the plurality of reservoirs.
Public/Granted literature
- US20130168899A1 TOP GATE MOLD WITH PARTICLE TRAP Public/Granted day:2013-07-04
Information query