Invention Grant
- Patent Title: Process for producing a liquid ejection head
- Patent Title (中): 用于制造液体喷射头的方法
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Application No.: US14467383Application Date: 2014-08-25
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Publication No.: US09254660B2Publication Date: 2016-02-09
- Inventor: Hiroaki Mihara , Etsuko Sawada , Shoji Shiba
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2013-181149 20130902
- Main IPC: G01D15/18
- IPC: G01D15/18 ; B41J2/16

Abstract:
A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×106 Pa or higher.
Public/Granted literature
- US20150060398A1 PROCESS FOR PRODUCING A LIQUID EJECTION HEAD Public/Granted day:2015-03-05
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