Invention Grant
- Patent Title: Photoacid generators and photoresists comprising same
- Patent Title (中): 含有它的光酸产生剂和光致抗蚀剂
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Application No.: US12965368Application Date: 2010-12-10
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Publication No.: US09255079B2Publication Date: 2016-02-09
- Inventor: Mingqi Li , Emad Aqad , Cong Liu , Joseph Mattia , Cheng-Bai Xu , George G. Barclay
- Applicant: Mingqi Li , Emad Aqad , Cong Liu , Joseph Mattia , Cheng-Bai Xu , George G. Barclay
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee: Rohm and Haas Electronic Materials, LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: C07D333/46
- IPC: C07D333/46 ; C07D335/02 ; C07D337/04 ; C07C303/32 ; C07C309/06 ; C07C309/12 ; G03F7/004 ; C07C381/12 ; C07D493/20 ; C07J31/00 ; G03F7/039 ; G03F7/038
Abstract:
New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
Public/Granted literature
- US20110250538A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2011-10-13
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