Invention Grant
US09255310B2 Cu—Mg—P based copper alloy material and method of producing the same
有权
Cu-Mg-P系铜合金材料及其制造方法
- Patent Title: Cu—Mg—P based copper alloy material and method of producing the same
- Patent Title (中): Cu-Mg-P系铜合金材料及其制造方法
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Application No.: US12801359Application Date: 2010-06-04
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Publication No.: US09255310B2Publication Date: 2016-02-09
- Inventor: Takeshi Sakurai , Yoshihiro Kameyama , Yoshio Abe
- Applicant: Takeshi Sakurai , Yoshihiro Kameyama , Yoshio Abe
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Shindoh Co., Ltd.
- Current Assignee: Mitsubishi Shindoh Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JP2009-291542 20091223
- Main IPC: C22C9/00
- IPC: C22C9/00 ; H01B5/02 ; C22F1/08

Abstract:
A copper alloy material includes, by mass %, Mg of 0.3 to 2%, P of 0.001 to 0.1%, and the balance including Cu and inevitable impurities. An area fraction of such crystal grains that an average misorientation between all the pixels in each crystal grain is less than 4° is 45 to 55% of a measured area, when orientations of all the pixels in the measured area of the surface of the copper alloy material are measured by an EBSD method with a scanning electron microscope of an electron backscattered diffraction image system and a boundary in which a misorientation between adjacent pixels is 5° or more is considered as a crystal grain boundary, and a tensile strength is 641 to 708 N/mm2, and a bending elastic limit value is 472 to 503 N/mm2.
Public/Granted literature
- US20110146855A1 Cu-Mg-P based copper alloy material and method of producing the same Public/Granted day:2011-06-23
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