Invention Grant
- Patent Title: Aluminum precursor composition
- Patent Title (中): 铝前体组合物
-
Application No.: US13966605Application Date: 2013-08-14
-
Publication No.: US09255324B2Publication Date: 2016-02-09
- Inventor: Wonyong Koh , Won Seok Han , Myeong-Ho Park
- Applicant: Up Chemical Co., Ltd.
- Applicant Address: KR
- Assignee: UP CHEMICAL CO., LTD.
- Current Assignee: UP CHEMICAL CO., LTD.
- Current Assignee Address: KR
- Main IPC: C23C16/20
- IPC: C23C16/20 ; C23C16/06
Abstract:
The present disclosure is related to an aluminum-containing precursor composition, especially a precursor composition which is vaporized to be used for vapor phase deposition processes such as chemical vapor deposition (CVD) or atomic layer deposition (ALD).
Public/Granted literature
- US20140050848A1 ALUMINUM PRECURSOR COMPOSITION Public/Granted day:2014-02-20
Information query
IPC分类:
