Invention Grant
- Patent Title: Systems and methods for remote plasma atomic layer deposition
- Patent Title (中): 远程等离子体原子层沉积的系统和方法
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Application No.: US13795819Application Date: 2013-03-12
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Publication No.: US09255326B2Publication Date: 2016-02-09
- Inventor: Jeong-Seok Na , Sanjay Gopinath
- Applicant: Novellus Systems, Inc.
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H05H1/24
- IPC: H05H1/24 ; C23C16/34 ; C23C16/455 ; C23C16/507
Abstract:
Systems and methods deposit a film on a substrate by introducing a precursor gas into a reaction volume of a processing chamber. A substrate is arranged in the reaction volume. After a predetermined soak period, the precursor gas is purged from the reaction volume. The substrate is exposed with plasma gas using a remote plasma source.
Public/Granted literature
- US20140272185A1 SYSTEMS AND METHODS FOR REMOTE PLASMA ATOMIC LAYER DEPOSITION Public/Granted day:2014-09-18
Information query
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