Invention Grant
- Patent Title: Localized, in-vacuum modification of small structures
- Patent Title (中): 局部化,小型结构的真空内修饰
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Application No.: US13236587Application Date: 2011-09-19
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Publication No.: US09255339B2Publication Date: 2016-02-09
- Inventor: Aurelien Philippe Jean Maclou Botman , Milos Toth , Steven Randolph , David H. Narum
- Applicant: Aurelien Philippe Jean Maclou Botman , Milos Toth , Steven Randolph , David H. Narum
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; John E. Hillert
- Main IPC: C25D5/04
- IPC: C25D5/04 ; C25D5/02 ; C25D17/12 ; C25D21/04 ; C25D21/12 ; C25D5/00 ; C25D17/00

Abstract:
A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or microelectromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
Public/Granted literature
- US20130068611A1 Localized, In-Vacuum Modification of Small Structures Public/Granted day:2013-03-21
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