Invention Grant
- Patent Title: Defect inspection method and device thereof
- Patent Title (中): 缺陷检查方法及其装置
-
Application No.: US13521086Application Date: 2011-02-09
-
Publication No.: US09255793B2Publication Date: 2016-02-09
- Inventor: Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
- Applicant: Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2010-027702 20100210
- International Application: PCT/JP2011/052787 WO 20110209
- International Announcement: WO2011/099537 WO 20110818
- Main IPC: G01N21/55
- IPC: G01N21/55 ; G06F19/00 ; G01B11/30 ; G01N21/956 ; H01L21/67

Abstract:
A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
Public/Granted literature
- US20120296576A1 DEFECT INSPECTION METHOD AND DEVICE THEREOF Public/Granted day:2012-11-22
Information query