Invention Grant
- Patent Title: Defect inspection method and device for same
- Patent Title (中): 缺陷检查方法和装置相同
-
Application No.: US14359221Application Date: 2012-10-22
-
Publication No.: US09255888B2Publication Date: 2016-02-09
- Inventor: Toshifumi Honda , Yuta Urano , Hisashi Hatano
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2011-256483 20111124
- International Application: PCT/JP2012/077234 WO 20121022
- International Announcement: WO2013/077125 WO 20130530
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/95 ; G01N21/956

Abstract:
In defect scanning carried out in a process of manufacturing a semiconductor or the like, a light detection optical system comprising a plurality of photosensors is used for detecting scattered light reflected from a sample. The photosensors used for detecting the quantity of weak background scattered light include a photon counting type photosensor having few pixels whereas the photosensors used for detecting the quantity of strong background scattered light include a photon counting type photosensor having many pixels or an analog photosensor. In addition, nonlinearity caused by the use of the photon counting type photosensor as nonlinearity of detection strength of defect scattered light is corrected in order to correct a detection signal of the defect scattered light.
Public/Granted literature
- US20140253912A1 DEFECT INSPECTION METHOD AND DEVICE FOR SAME Public/Granted day:2014-09-11
Information query