Invention Grant
- Patent Title: Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
- Patent Title (中): 基板，测量属性的方法，检查装置和光刻设备
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Application No.: US14825765Application Date: 2015-08-13
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Publication No.: US09255892B2Publication Date: 2016-02-09
- Inventor: Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/14 ; G03B27/32 ; H01L23/544 ; G01N21/95 ; G03F7/20 ; G01N21/47 ; G02B5/18 ; G03F9/00
Abstract:
A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
Public/Granted literature
- US20150346113A1 Substrate, a Method of Measuring a Property, an Inspection Apparatus and a Lithographic Apparatus Public/Granted day:2015-12-03
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