Invention Grant
- Patent Title: Angle-resolved antisymmetric scatterometry
- Patent Title (中): 角分辨反对称散射法
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Application No.: US14500162Application Date: 2014-09-29
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Publication No.: US09255895B2Publication Date: 2016-02-09
- Inventor: Daniel Kandel , Vladimir Levinski , Noam Sapiens
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/956
- IPC: G01N21/956 ; G01B11/14 ; G01B11/24 ; G03F7/20

Abstract:
A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS1) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS2) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS1) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS2) associated with the second scatterometry cell.
Public/Granted literature
- US20150177162A1 Angle-Resolved Antisymmetric Scatterometry Public/Granted day:2015-06-25
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