Invention Grant
- Patent Title: Mask plate and a method for producing a substrate mark
- Patent Title (中): 掩模板及其制造方法
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Application No.: US14501194Application Date: 2014-09-30
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Publication No.: US09256121B2Publication Date: 2016-02-09
- Inventor: Xiaodan Wei , Xingqiang Zhang , Wei Zhao , Hongxu Yan
- Applicant: BOE Technology Group Co., Ltd. , Chengdu Boe Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Beijing CN Chengdu
- Assignee: Boe Technology Group Co., Ltd.,Chengdu Boe Optoelectronics Technology Co., Ltd.
- Current Assignee: Boe Technology Group Co., Ltd.,Chengdu Boe Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Chengdu
- Agency: Calfee, Halter & Griswold LLP
- Priority: CN201410203162 20140514
- Main IPC: G03F1/40
- IPC: G03F1/40 ; G03F1/42 ; G03F1/38 ; G03F7/40 ; G03F7/42 ; G03F7/20

Abstract:
The general inventive concepts relate to the field of display technology, and provide a mask plate and a method for producing a substrate mark to increase the accuracy of the production of a substrate mark, and decrease the difficulty in monitoring products and the production cost. An exemplary mask plate comprises: a display region mask part; at least one pair of test mark mask parts, a test mark mask part being located on either side of the display region mask part and their positions being opposite to each other; and a protection mark mask part correspondingly disposed on the outside of each test mark mask part relative to the display region mask part, wherein the pattern outline of the protection mark mask part is larger than that of the test mark mask part.
Public/Granted literature
- US20150331310A1 MASK PLATE AND A METHOD FOR PRODUCING A SUBSTRATE MARK Public/Granted day:2015-11-19
Information query
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