Invention Grant
US09256130B2 Method for manufacturing light-shielding mask for curing cell sealant
有权
用于固化细胞密封剂的遮光掩模的制造方法
- Patent Title: Method for manufacturing light-shielding mask for curing cell sealant
- Patent Title (中): 用于固化细胞密封剂的遮光掩模的制造方法
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Application No.: US14235392Application Date: 2013-10-18
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Publication No.: US09256130B2Publication Date: 2016-02-09
- Inventor: Chaode Mo , Chunliang Lee
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201310483206 20131015
- International Application: PCT/CN2013/085507 WO 20131018
- International Announcement: WO2015/054905 WO 20150423
- Main IPC: G03F1/38
- IPC: G03F1/38 ; G03F7/16 ; G03F7/20 ; G03F7/26 ; G03F1/44 ; G03F1/42 ; G02F1/1339 ; G03F1/00 ; G02F1/13

Abstract:
The present invention provides a method for manufacturing a light-shielding mask for curing a sealant, including the following steps: step 1: providing a transparent substrate (20); step 2: sequentially forming a metal layer (22) and a photoresist layer (24) on the transparent substrate (20); Step 3: carrying out exposure on an edge of the photoresist layer (24) to form an inspection mark (242); step 4: subjecting the photoresist layer (24) to exposure along a predetermined trace by adopting an edge exposure process, wherein the predetermined trace corresponds to a predetermined trace of a sealant to be formed in a liquid crystal display panel; step 5: removing the exposed portion of the photoresist layer (24) to expose the metal layer (22); step 6: subjecting the exposed portion of the metal layer (22) to etching and removing the unexposed portion of the photoresist layer (24); and step 7: forming a transparent protection layer (26) on the metal layer (22) and the transparent substrate (20). The present invention uses an edge exposure process to achieve exposure of the photoresist layer so that no specific masking plate is needed and the number of masking plates prepared can be effectively reduced, thereby reducing the cost the material for manufacture.
Public/Granted literature
- US20150331321A1 METHOD FOR MANUFACTURING LIGHT-SHIELDING MASK FOR CURING CELL SEALANT Public/Granted day:2015-11-19
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