Invention Grant
US09256137B2 Exposure apparatus, liquid holding method, and device manufacturing method
有权
曝光装置,液体保持方法和装置制造方法
- Patent Title: Exposure apparatus, liquid holding method, and device manufacturing method
- Patent Title (中): 曝光装置,液体保持方法和装置制造方法
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Application No.: US13593079Application Date: 2012-08-23
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Publication No.: US09256137B2Publication Date: 2016-02-09
- Inventor: Hiroyuki Nagasaka
- Applicant: Hiroyuki Nagasaka
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-153959 20120709
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.
Public/Granted literature
- US20130059253A1 EXPOSURE APPARATUS, LIQUID HOLDING METHOD, AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-03-07
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