Invention Grant
US09256137B2 Exposure apparatus, liquid holding method, and device manufacturing method 有权
曝光装置,液体保持方法和装置制造方法

  • Patent Title: Exposure apparatus, liquid holding method, and device manufacturing method
  • Patent Title (中): 曝光装置,液体保持方法和装置制造方法
  • Application No.: US13593079
    Application Date: 2012-08-23
  • Publication No.: US09256137B2
    Publication Date: 2016-02-09
  • Inventor: Hiroyuki Nagasaka
  • Applicant: Hiroyuki Nagasaka
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JP2012-153959 20120709
  • Main IPC: G03B27/52
  • IPC: G03B27/52 G03F7/20
Exposure apparatus, liquid holding method, and device manufacturing method
Abstract:
An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.
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