Invention Grant
- Patent Title: Pellicle mounting system and method
- Patent Title (中): 薄膜安装系统和方法
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Application No.: US13929333Application Date: 2013-06-27
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Publication No.: US09256142B2Publication Date: 2016-02-09
- Inventor: Yeh Lee-Chih , Hsin-Chang Lee , Chia-Jen Chen , Anthony Yen , Ming-Jiun Yao
- Applicant: Taiwn Semiconductor Manufacturing Company Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/62

Abstract:
A pellicle mounting method is provided. The method includes aligning a mounting apparatus with a top surface of a pellicle frame, the mounting apparatus having a continuous duct extending therethrough and a plurality of contact pins projecting from the mounting apparatus. The method also includes introducing a pressurizing fluid into the continuous duct that causes each of the plurality of contact pins to engage the top surface of the pellicle frame with a substantially equal force, a combined force of the plurality of contact pins urging a bottom surface of the pellicle frame against a top surface of a photomask, the combined force being adjustable based on a pressure within the continuous duct. Further, the method includes adjusting the pressure within the continuous duct until the pressure is approximately equal to a pre-determined optimal pressure.
Public/Granted literature
- US20140253898A1 PELLICLE MOUNTING SYSTEM AND METHOD Public/Granted day:2014-09-11
Information query
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