Invention Grant
- Patent Title: Templates including self-assembled block copolymer films
- Patent Title (中): 包括自组装嵌段共聚物膜的模板
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Application No.: US14075647Application Date: 2013-11-08
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Publication No.: US09257256B2Publication Date: 2016-02-09
- Inventor: Dan B. Millward , Donald L. Westmoreland , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01J37/02
- IPC: H01J37/02 ; B81C1/00 ; B82Y30/00 ; G03F7/00 ; G03F7/26
Abstract:
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
Public/Granted literature
- US20140060736A1 TEMPLATES INCLUDING SELF-ASSEMBLED BLOCK COPOLYMER FILMS Public/Granted day:2014-03-06
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