Invention Grant
US09257263B2 Rectangular filtered vapor plasma source and method of controlling vapor plasma flow
有权
矩形过滤蒸汽等离子体源和控制蒸气等离子体流的方法
- Patent Title: Rectangular filtered vapor plasma source and method of controlling vapor plasma flow
- Patent Title (中): 矩形过滤蒸汽等离子体源和控制蒸气等离子体流的方法
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Application No.: US12898272Application Date: 2010-10-05
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Publication No.: US09257263B2Publication Date: 2016-02-09
- Inventor: Vladimir Gorokhovsky
- Applicant: Vladimir Gorokhovsky
- Applicant Address: US CO Lafayette
- Assignee: Nano-Product Engineering, LLC
- Current Assignee: Nano-Product Engineering, LLC
- Current Assignee Address: US CO Lafayette
- Agency: Lathrop & Gage LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C14/06 ; C23C14/32

Abstract:
The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors (62, 64, 66, 68) disposed along the short sides (32c, 32d) of a rectangular target (32) behind the target, and a magnetic focusing system disposed along the long sides (32a, 32b) of the target (32) in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides (32a, 32b) of the target (32). The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor (62, 64, 66, 68) can be controlled independently. In a further embodiment, electrically independent steering conductors (62, 64, 66, 68) are disposed along opposite long sides (32a, 32b) of the cathode plate (32), and by selectively varying a current through one conductor, the path of the arc spot shifts to widen the erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow.
Public/Granted literature
- US20110100800A1 Rectangular Filtered Vapor Plasma Source and Method of Controlling Vapor Plasma Flow Public/Granted day:2011-05-05
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