Invention Grant
- Patent Title: Metrology marks for bidirectional grating superposition patterning processes
- Patent Title (中): 双向光栅叠加图案化程序的计量标记
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Application No.: US13968336Application Date: 2013-08-15
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Publication No.: US09257351B2Publication Date: 2016-02-09
- Inventor: Christopher P. Ausschnitt , Nelson M. Felix , Scott S. Halle
- Applicant: International Business Machines Corporation
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: DeLio, Peterson & Curcio, LLC
- Agent Kelly M. Nowak
- Main IPC: G03F7/26
- IPC: G03F7/26 ; H01L21/66 ; G03F7/20

Abstract:
Cut spacer reference marks, targets having such cut spacer reference marks, and methods of making the same by forming spacer gratings around grating lines on a first layer, and fabricating a template mask that extends across and perpendicular to such spacer gratings. Cut spacer gratings are etched into a second layer using the template mask to superimpose at least a portion of the spacer gratings of the first layer into the second layer.
Public/Granted literature
- US20150050755A1 METROLOGY MARKS FOR BIDIRECTIONAL GRATING SUPERPOSITION PATTERNING PROCESSES Public/Granted day:2015-02-19
Information query
IPC分类: