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US09257351B2 Metrology marks for bidirectional grating superposition patterning processes 有权
双向光栅叠加图案化程序的计量标记

Metrology marks for bidirectional grating superposition patterning processes
Abstract:
Cut spacer reference marks, targets having such cut spacer reference marks, and methods of making the same by forming spacer gratings around grating lines on a first layer, and fabricating a template mask that extends across and perpendicular to such spacer gratings. Cut spacer gratings are etched into a second layer using the template mask to superimpose at least a portion of the spacer gratings of the first layer into the second layer.
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