- Patent Title: 3-D non-volatile memory device and method of manufacturing the same
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Application No.: US14505205Application Date: 2014-10-02
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Publication No.: US09257442B2Publication Date: 2016-02-09
- Inventor: Seo Hyun Lee , Byung Soo Park , Sang Hyun Oh , Sun Mi Park
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2011-0038985 20110426
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L29/792

Abstract:
A three dimensional (3-D) non-volatile memory device includes a pipe gate including a first pipe gate, a second pipe gate formed on the first pipe gate, and a first interlayer insulating layer interposed between the first pipe gate and the second pipe gate, word lines alternately stacked with second interlayer insulating layers on the pipe gate, a pipe channel buried within the pipe gate, and memory cell channels coupled to the pipe channel and arranged to pass through the word lines and the second interlayer insulating layers.
Public/Granted literature
- US20150054052A1 3-D NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-02-26
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