Invention Grant
- Patent Title: Protective sidewall techniques for RRAM
- Patent Title (中): RRAM的保护侧壁技术
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Application No.: US14332577Application Date: 2014-07-16
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Publication No.: US09257642B1Publication Date: 2016-02-09
- Inventor: Yao-Wen Chang , Jian-Shiou Huang , Hsing-Lien Lin , Cheng-Yuan Tsai , Chia-Shiung Tsai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L27/112 ; H01L29/417 ; H01L29/45 ; H01L29/86 ; H01L45/00

Abstract:
Some embodiments relate to a resistive random access memory (RRAM). The RRAM includes a RRAM bottom metal electrode, a variable resistance dielectric layer arranged over the RRAM bottom metal electrode, and a RRAM top metal electrode arranged over the variable resistance dielectric layer. A capping layer is arranged over the RRAM top metal electrode. A lower surface of the capping layer and an upper surface of the RRAM top metal electrode meet at an interface. Protective sidewalls are adjacent to outer sidewalls of the RRAM top metal electrode. The protective sidewalls have upper surfaces at least substantially aligned to the interface at which the upper surface of the RRAM top metal electrode meets the lower surface of the capping layer.
Public/Granted literature
- US20160020390A1 PROTECTIVE SIDEWALL TECHNIQUES FOR RRAM Public/Granted day:2016-01-21
Information query
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