Invention Grant
- Patent Title: Laser device for exposure apparatus
- Patent Title (中): 用于曝光设备的激光装置
-
Application No.: US13401734Application Date: 2012-02-21
-
Publication No.: US09257809B2Publication Date: 2016-02-09
- Inventor: Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
- Applicant: Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2010-036662 20100222
- Main IPC: H01S3/223
- IPC: H01S3/223 ; H01S3/03 ; H01S3/134 ; H01S3/23 ; H01S3/036 ; G03F7/20

Abstract:
A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.
Public/Granted literature
- US20120236885A1 LASER DEVICE FOR EXPOSURE APPARATUS Public/Granted day:2012-09-20
Information query