Invention Grant
- Patent Title: Substrate structure having component-disposing area and manufacturing process thereof
- Patent Title (中): 具有部件配置区域的基板结构及其制造工艺
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Application No.: US13740286Application Date: 2013-01-14
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Publication No.: US09258908B2Publication Date: 2016-02-09
- Inventor: Cheng-Jui Chang , Ming-Hao Wu
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: Jianq Chyun IP Office
- Priority: TW101143499A 20121121
- Main IPC: H05K1/16
- IPC: H05K1/16 ; H05K3/46 ; H01L23/13 ; H01L23/00 ; H01L23/498 ; H05K1/18 ; H01L21/48

Abstract:
A substrate structure having a component-disposing area and a process thereof are provided. The substrate structure having a component-disposing area includes a core layer, a first dielectric-layer, a laser-resistant metallic-pattern and a second dielectric-layer. The core layer includes a first surface, a component-disposing area and a patterned metallic-layer disposed on the first surface and including multiple pads, and the pads are located within the component-disposing area. The first dielectric-layer is disposed on the core layer and includes multiple openings to respectively expose the pads. The laser-resistant metallic-pattern is disposed on the first dielectric-layer and surrounds a projection area of the first dielectric-layer which the component-disposing area is orthogonally projected on. The second dielectric-layer is disposed on the first dielectric-layer and covers the laser-resistant metallic-pattern, the second dielectric-layer includes a component-disposing cavity corresponding to the projection area, penetrating through the second dielectric-layer and communicated with the openings to expose the pads.
Public/Granted literature
- US20140138130A1 SUBSTRATE STRUCTURE HAVING COMPONENT-DISPOSING AREA AND MANUFACTURING PROCESS THEREOF Public/Granted day:2014-05-22
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