Invention Grant
- Patent Title: Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate
- Patent Title (中): 浸液，浸液清洗组合物和底物的清洗方法
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Application No.: US13856442Application Date: 2013-04-04
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Publication No.: US09259668B2Publication Date: 2016-02-16
- Inventor: Kentaro Harada , Goji Wakamatsu
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B01D15/00
- IPC: B01D15/00 ; B01D39/00 ; C02F1/42 ; C08K5/07 ; B01J20/26 ; B01J20/282 ; B01J20/32 ; B24B1/00 ; B24C1/00 ; B24B7/19 ; B24B7/30 ; B24B57/00 ; C08K5/103
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.
Public/Granted literature
- US20130220930A1 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE Public/Granted day:2013-08-29
Information query
