Invention Grant
- Patent Title: Salt and photoresist composition comprising the same
- Patent Title (中): 包含其的盐和光致抗蚀剂组合物
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Application No.: US13295943Application Date: 2011-11-14
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Publication No.: US09260407B2Publication Date: 2016-02-16
- Inventor: Yukako Anryu , Koji Ichikawa
- Applicant: Yukako Anryu , Koji Ichikawa
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-254541 20101115; JP2011-084367 20110406; JP2011-194759 20110907
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D327/02 ; C07D327/04 ; C07D327/06 ; C07D333/46 ; C07D335/02 ; C07D337/04 ; C07C303/32 ; C07C309/04 ; C07C309/06 ; C07C309/12 ; C07C309/17 ; C07C309/19 ; G03F7/039 ; G03F7/38 ; G03F7/20
Abstract:
The present invention provides a salt represented by the formula (I): wherein R1, R2, L1, Y, R3, R4, R5, R6, R7, n, s, and R8 represent variables outlined in the specification.
Public/Granted literature
- US20120122032A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2012-05-17
Information query
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