Invention Grant
- Patent Title: Underpotential depositon of metal monolayers from ionic liquids
- Patent Title (中): 来自离子液体的金属单层的欠电位沉积
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Application No.: US13470713Application Date: 2012-05-14
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Publication No.: US09260789B2Publication Date: 2016-02-16
- Inventor: Weilong Zhang , Xiaomei Yu , Lei Chen , Mark R. Jaworowski , Joseph J. Sangiovanni
- Applicant: Weilong Zhang , Xiaomei Yu , Lei Chen , Mark R. Jaworowski , Joseph J. Sangiovanni
- Applicant Address: US CT Hartford
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Hartford
- Agency: Kinney & Lange, P.A.
- Main IPC: C25D5/10
- IPC: C25D5/10 ; C25D5/00 ; C25D5/34 ; C25D5/44 ; C25D5/48 ; C25D3/66 ; C23C28/00 ; B32B15/01 ; C23C28/02 ; C25D3/44 ; C25D5/18 ; C25D5/40
Abstract:
A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Φs. The non-diffused monolayer deposited on the surface has a second surface work function value Φs that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
Public/Granted literature
- US20130302641A1 UNDERPOTENTIAL DEPOSITON OF METAL MONOLAYERS FROM IONIC LIQUIDS Public/Granted day:2013-11-14
Information query
