Invention Grant
- Patent Title: Methodology for performing depth estimation with defocused images under extreme lighting conditions
- Patent Title (中): 在极端照明条件下进行散焦图像深度估算的方法
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Application No.: US13416049Application Date: 2012-03-09
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Publication No.: US09262833B2Publication Date: 2016-02-16
- Inventor: Pingshan Li , Kensuke Miyagi
- Applicant: Pingshan Li , Kensuke Miyagi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Haverstock & Owens, LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; H04N5/232

Abstract:
A methodology for performing a depth estimation procedure with defocused images under extreme lighting conditions includes a camera device with a sensor for capturing blur images of a photographic target under extreme lighting conditions. The extreme lighting conditions may include over-exposed conditions and/or under-exposed conditions. The camera device also includes a depth generator that performs the depth estimation procedure by utilizing the captured blur images. The depth estimation procedure includes a clipped-pixel substitution procedure to compensate for the extreme lighting conditions.
Public/Granted literature
- US20130141537A1 Methodology For Performing Depth Estimation With Defocused Images Under Extreme Lighting Conditions Public/Granted day:2013-06-06
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