Invention Grant
- Patent Title: Patterning of magnetic thin film using energized ions
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Application No.: US14029248Application Date: 2013-09-17
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Publication No.: US09263078B2Publication Date: 2016-02-16
- Inventor: Steven Verhaverbeke , Omkaram Nalamasu , Majeed A. Foad , Mahalingam Venkatesan , Nety M. Krishna
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C14/48
- IPC: C23C14/48 ; C23C14/04 ; G11B5/84 ; C23C14/58 ; C23C14/18 ; G11B5/855
Abstract:
A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
Public/Granted literature
- US20140017518A1 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS Public/Granted day:2014-01-16
Information query
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