Invention Grant
US09263228B2 Integrated photoemission sources and scalable photoemission structures
有权
集成的光电子发射源和可扩展的光电子结构
- Patent Title: Integrated photoemission sources and scalable photoemission structures
- Patent Title (中): 集成的光电子发射源和可扩展的光电子结构
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Application No.: US14202646Application Date: 2014-03-10
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Publication No.: US09263228B2Publication Date: 2016-02-16
- Inventor: Ravi K. Bonam
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01J37/073
- IPC: H01J37/073 ; H01J1/34 ; H01J9/12 ; H01J37/317

Abstract:
A scalable, integrated photoemitter device and method of manufacture using conventional CMOS manufacturing techniques. The photoemitter device has a first semiconductor substrate having a plurality of photonic sources formed on top in a first material layer, the plurality of photonic sources and the material layer forming a planar surface. A second substrate is bonded to the planar surface, the second substrate having a plurality of photoemitter structures formed on top in a second material layer, each photoemitter structure in alignment with a respective photonic source of the first substrate and configured to generate particle beams responsive to light from a respective light source. Additionally provided is a multi-level photoemitter of tapered design for implementation in the scalable, integrated photoemitter device. Conventional CMOS manufacturing techniques are also implemented to build the multi-level photoemitter of tapered design.
Public/Granted literature
- US20150255241A1 INTEGRATED PHOTOEMISSION SOURCES AND SCALABLE PHOTOEMISSION STRUCTURES Public/Granted day:2015-09-10
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