Invention Grant
US09263623B2 Plasma spray deposition of photovoltaic thin films with grain boundary minimization
有权
具有晶界最小化的光伏薄膜的等离子体喷涂沉积
- Patent Title: Plasma spray deposition of photovoltaic thin films with grain boundary minimization
- Patent Title (中): 具有晶界最小化的光伏薄膜的等离子体喷涂沉积
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Application No.: US14570440Application Date: 2014-12-15
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Publication No.: US09263623B2Publication Date: 2016-02-16
- Inventor: Brian Josef Bartholomeusz , Michael Bartholomeusz
- Applicant: ZETTA RESEARCH AND DEVELOPMENT LLC—AQT SERIES
- Applicant Address: US DE Wilmington
- Assignee: ZETTA RESEARCH AND DEVELOPMENT LLC—AQT SERIES
- Current Assignee: ZETTA RESEARCH AND DEVELOPMENT LLC—AQT SERIES
- Current Assignee Address: US DE Wilmington
- Agency: Mattingly & Malur, PC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; H01L31/032 ; H01L31/0352 ; H01L21/02
Abstract:
Methods are described for depositing thin films, such as those used in forming a photovoltaic cell or device. In particular embodiments, one or more layers are deposited on a substrate by plasma spraying over the substrate. A grain size of grains in each of the one or more layers is at least approximately two times greater than a thickness of the respective layer. Accordingly, large flat-grained structures are formed in each respective layer, and grain boundaries within each respective layer can be minimized.
Public/Granted literature
- US20150140724A1 DEPOSITION OF PHOTOVOLTAIC THIN FILMS BY PLASMA SPRAY DEPOSITION Public/Granted day:2015-05-21
Information query
IPC分类:
