Invention Grant
- Patent Title: Structure and method for integrated microphone
- Patent Title (中): 集成麦克风的结构和方法
-
Application No.: US13973812Application Date: 2013-08-22
-
Publication No.: US09264833B2Publication Date: 2016-02-16
- Inventor: Jung-Huei Peng , Chia-Hua Chu , Yao-Te Huang , Chin-Yi Cho , Li-Min Hung , Chun-Wen Cheng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H04R19/04
- IPC: H04R19/04 ; H04R31/00 ; H04R19/00

Abstract:
The present disclosure provides one embodiment of an integrated microphone structure. The integrated microphone structure includes a first silicon substrate patterned as a first plate; a silicon oxide layer formed on one side of the first silicon substrate; a second silicon substrate bonded to the first substrate through the silicon oxide layer such that the silicon oxide layer is sandwiched between the first and second silicon substrates; and a diaphragm secured on the silicon oxide layer and disposed between the first and second silicon substrates, wherein the first plate and the diaphragm are configured to form a capacitive microphone.
Public/Granted literature
- US20140270272A1 Structure and Method for Integrated Microphone Public/Granted day:2014-09-18
Information query