Invention Grant
US09266189B2 Structure, method of making a structure, and method of reducing galvanic corrosion
有权
结构,制造结构的方法以及减少电偶腐蚀的方法
- Patent Title: Structure, method of making a structure, and method of reducing galvanic corrosion
- Patent Title (中): 结构,制造结构的方法以及减少电偶腐蚀的方法
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Application No.: US13739200Application Date: 2013-01-11
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Publication No.: US09266189B2Publication Date: 2016-02-23
- Inventor: Kiran Deshpande , Kaustubh Narhar Kulkarni
- Applicant: GM Global Technology Operations LLC
- Applicant Address: US MI Detroit
- Assignee: GM Global Technology Operations LLC
- Current Assignee: GM Global Technology Operations LLC
- Current Assignee Address: US MI Detroit
- Agency: Dierker & Associates, P.C.
- Main IPC: B25G3/34
- IPC: B25G3/34 ; F16B11/00 ; F16B12/04 ; F16L13/00 ; B23K20/02 ; B23K37/04 ; B23K20/04

Abstract:
An example of a structure includes a first component including a first material, and a second component joined to the first component. The second component includes a second material that is dissimilar from the first material. A spacer is disposed between the first and second components, and the spacer eliminates galvanic corrosion of the first component at an interface between the first component and the second component. The spacer includes a first layer consisting of the first material, a second layer bonded to the first layer and consisting of a third material, and a third layer bonded to the second layer and consisting of the second material. The third material of the second layer is different from the first material and different from the second material. Other examples are directed to a method of making the structure, and a method for reducing galvanic corrosion.
Public/Granted literature
- US20140199114A1 STRUCTURE, METHOD OF MAKING A STRUCTURE, AND METHOD OF REDUCING GALVANIC CORROSION Public/Granted day:2014-07-17
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