Invention Grant
- Patent Title: Fumaric acid diester based resin for retardation film and retardation film comprising the same
- Patent Title (中): 富马酸二酯基延迟膜用树脂及其相位差膜
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Application No.: US13807106Application Date: 2011-06-24
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Publication No.: US09266988B2Publication Date: 2016-02-23
- Inventor: Kenichi Makita , Shinji Shimosato , Shinsuke Toyomasu , Tohru Doi
- Applicant: Kenichi Makita , Shinji Shimosato , Shinsuke Toyomasu , Tohru Doi
- Applicant Address: JP Shunan-shi
- Assignee: TOSOH CORPORATION
- Current Assignee: TOSOH CORPORATION
- Current Assignee Address: JP Shunan-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-154156 20100706
- International Application: PCT/JP2011/064508 WO 20110624
- International Announcement: WO2012/005120 WO 20120112
- Main IPC: C08F222/10
- IPC: C08F222/10 ; C08F222/00 ; C08F222/14 ; G02B1/04 ; G02F1/13363 ; G02B5/30

Abstract:
A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a refractive index in the film in-plane direction orthogonal thereto is designated as ny, and a refractive index in the thickness direction of the film is designated as nz, the respective refractive indices are satisfied with a relationship of (nx≦ny
Public/Granted literature
- US20130102751A1 FUMARIC ACID DIESTER BASED RESIN FOR RETARDATION FILM AND RETARDATION FILM COMPRISING THE SAME Public/Granted day:2013-04-25
Information query
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