Invention Grant
US09267077B2 Chrome-free methods of etching organic polymers with mixed acid solutions
有权
用混合酸溶液蚀刻有机聚合物的无铬方法
- Patent Title: Chrome-free methods of etching organic polymers with mixed acid solutions
- Patent Title (中): 用混合酸溶液蚀刻有机聚合物的无铬方法
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Application No.: US13863979Application Date: 2013-04-16
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Publication No.: US09267077B2Publication Date: 2016-02-23
- Inventor: Katharina Weitershaus , Wan Zhang-Beglinger , Andreas Scheybal , Jonas Guebey
- Applicant: Rohm and Haas Electronic Materials LLC
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Agent John J. Piskorski
- Main IPC: C09K13/06
- IPC: C09K13/06 ; C08J7/12 ; C23C18/16 ; C23C18/20 ; C23C18/24 ; C23C18/30 ; C25D3/38
Abstract:
A chrome-free acidic aqueous solution of sulfuric acid and one or more organic acids and manganese (II) and (III) ions is applied to an organic polymer surface to etch the surface. The etched surface is then plated with metal.
Public/Granted literature
- US20140306147A1 CHROME-FREE METHODS OF ETCHING ORGANIC POLYMERS WITH MIXED ACID SOLUTIONS Public/Granted day:2014-10-16
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