Invention Grant
- Patent Title: Contaminant measurement substrate, apparatus and method for fabricating substrate using the same
- Patent Title (中): 污染物测量基板,使用其的基板的制造方法
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Application No.: US14099978Application Date: 2013-12-08
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Publication No.: US09267899B2Publication Date: 2016-02-23
- Inventor: Chong Jin Park
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO.,LTD
- Current Assignee: SAMSUNG DISPLAY CO.,LTD
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0088059 20130725
- Main IPC: H01L51/56
- IPC: H01L51/56 ; G01N21/88 ; G01N21/95 ; G01N21/94 ; H01L51/00

Abstract:
An apparatus for fabricating a substrate includes a chamber providing a space in which processes are performed, a contaminant measurement substrate including a base material configured to collect contaminants, and laser marks on the base material and defining coordinates of the base material, a first stage disposed inside the chamber, and upon which the contaminant measurement substrate is seated during collection of the contaminants of the chamber, a second stage disposed outside the chamber, and upon which the contaminant measurement substrate is seated during measurement of the contaminants of the chamber collected on the contaminant measurement substrate, and a contaminant measurement light source disposed on an upper portion of the second stage and configured to irradiate the contaminant measurement substrate seated on the second stage with light during the measurement of the contaminants of the chamber collected on the contaminant measurement substrate.
Public/Granted literature
- US20150026945A1 CONTAMINANT MEASUREMENT SUBSTRATE, APPARATUS AND METHOD FOR FABRICATING SUBSTRATE USING THE SAME Public/Granted day:2015-01-29
Information query
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