Invention Grant
US09267927B2 Robust and low backpressure on-column tunneled frit for nano-UPLC-MS applications
有权
用于纳米UPLC-MS应用的坚固和低背压柱上隧道玻璃料
- Patent Title: Robust and low backpressure on-column tunneled frit for nano-UPLC-MS applications
- Patent Title (中): 用于纳米UPLC-MS应用的坚固和低背压柱上隧道玻璃料
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Application No.: US13112519Application Date: 2011-05-20
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Publication No.: US09267927B2Publication Date: 2016-02-23
- Inventor: Chao-Jung Chen , Mei-Chun Tseng , Yet-Ran Chen
- Applicant: Chao-Jung Chen , Mei-Chun Tseng , Yet-Ran Chen
- Applicant Address: TW Taipei
- Assignee: Academia Sinica
- Current Assignee: Academia Sinica
- Current Assignee Address: TW Taipei
- Agency: Drinker Biddle & Reath LLP
- Main IPC: G01N30/60
- IPC: G01N30/60 ; B01D15/22

Abstract:
A durable on-column tunneled frit was developed for use in nanoflow UPLC systems. The frit was tunneled during sol-gel reaction. The tunneled-frit fabrication process is easy and reproducible in terms of back pressure and durability. This design creates low backpressure with high liquid flow, which is suitable for the nanoflowUPLC application. A short packing (2 cm C18 particle) tunneled-frit column was demonstrated to sustain 10,000 psi continuous liquid flow for over one week without any particle leakage or pressure instability. The tunneled-frit was also successfully applied to the fabrication of nanoUPLC trapping and analytical column system. It was demonstrated to have high separation efficiency and sensitivity for the analysis of tryptic peptides as well as improved detection sensitivity for phosphopeptide analysis.
Public/Granted literature
- US20110284466A1 ROBUST AND LOW BACKPRESSURE ON-COLUMN TUNNELED FRIT FOR NANO-UPLC-MS APPLICATIONS Public/Granted day:2011-11-24
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