Invention Grant
- Patent Title: Photosensitive resin composition for color filter and application thereof
- Patent Title (中): 用于滤色器的光敏树脂组合物及其应用
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Application No.: US14801818Application Date: 2015-07-16
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Publication No.: US09268218B2Publication Date: 2016-02-23
- Inventor: Jung-Pin Hsu
- Applicant: CHI MEI CORPORATION
- Applicant Address: TW Tainan
- Assignee: CHI MEI CORPORATION
- Current Assignee: CHI MEI CORPORATION
- Current Assignee Address: TW Tainan
- Agency: CKC & Partners Co., Ltd.
- Priority: TW103110904A 20140324; TW103126442A 20140801
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G03F7/033 ; G02F1/1335 ; G03F7/00 ; G02B5/22 ; G02B1/04 ; G03F7/30

Abstract:
The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).
Public/Granted literature
- US20150323863A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF Public/Granted day:2015-11-12
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